International Patent: CARBON DIOXIDE CAPTURE USING HIGH SILICON LOW ALUMINUM CO2-SELECTIVE ADSORBENT

GENEVA, July 18 -- ECHENEIDAE INC. filed a patent application (US2026/011165) for “CARBON DIOXIDE CAPTURE USING HIGH SILICON LOW ALUMINUM CO2-SELECTIVE ADSORBENT”. With publication no. WO/2026/152161, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: B01J 20/30

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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