GENEVA, Aug. 31 -- SUMITOMO RIKO COMPANY LIMITED filed a patent application (JP2026/004690) for “BIPOLAR PLATE WITH DOUBLE-SIDED GASKET, WATER ELECTROLYSIS DEVICE PROVIDED WITH BIPOLAR PLATE WITH DOUBLE-SIDED GASKET, METHOD FOR MANUFACTURING BIPOLAR PLATE WITH DOUBLE-SIDED GASKET, AND METHOD FOR MANUFACTURING WATER ELECTROLYSIS DEVICE PROVIDED WITH BIPOLAR PLATE WITH DOUBLE-SIDED GASKET”. With publication no. WO/2026/177000, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C25B 13/02
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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