International Patent: AUTOMATIC ANALYSIS DEVICE, DRYING MECHANISM, AND DRYING METHOD

GENEVA, Sept. 18 -- HITACHI HIGH-TECH CORPORATION filed a patent application (JP2025/027085) for “AUTOMATIC ANALYSIS DEVICE, DRYING MECHANISM, AND DRYING METHOD”. With publication no. WO/2026/186175, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G01N 35/10

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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