INTERNATIONAL PATENT: ATOMIC NANO MATERIALS AND EQUIPMENT CO., LTD., 南京原磊纳米材料有限公司 FILES APPLICATION FOR "ATOMIC LAYER DEPOSITION COATING METHOD AND SYSTEM FOR DEVICE WITH HIGH-ASPECT-RATIO STRUCTURE"

GENEVA, May 17 -- ATOMIC NANO MATERIALS AND EQUIPMENT CO., LTD. (22nd Floor, Building B, Qingyun Building, 266 Puyun Road, Jiangbei New DistrictNanjing, Jiangsu 210000), 南京原磊纳米材料有限公司 (中国江苏省南京市江北新区浦云路266号青云大厦B栋22层) filed a patent application (PCT/CN2025/118024) for "ATOMIC LAYER DEPOSITION COATING METHOD AND SYSTEM FOR DEVICE WITH HIGH-ASPECT-RATIO STRUCTURE" on Aug 29, 2025. With publication no. WO/2026/098031, the details related to the patent application was published on May 15, 2026.

Notably, the patent...