GENEVA, Dec. 22 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/063670) for "VENTED SEALING SYSTEMS AND METHODS FOR A LITHOGRAPHY APPARATUS" on May 19, 2025. With publication no. WO/2025/256868, the details related to the patent application was published on Dec 18, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SIZER, Jackson, Raymond (77 Danbury RoadWilton, Connecticut 06897), CRISTINA, Gregory, Thomas (77 Danbury RoadWilton, Connecticut 06897)
Abstract: Patterning devices enter a lithography apparatus through a load lock. The load lock comp...