INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS, METHODS AND SOFTWARE FOR MODEL-BASED FOCUS AND DOSE METROLOGY WITH STACK MONITORING"

GENEVA, April 5 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/075701) for "SYSTEMS, METHODS, AND SOFTWARE FOR MODEL-BASED FOCUS AND DOSE METROLOGY WITH STACK MONITORING" on Sep 09, 2025. With publication no. WO/2026/068191, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FU, Jiyou (80 W Tasman DriveSan Jose, California 95134), ZHANG, Chenyu (80 W Tasman DriveSan Jose, California 95134)

Abstract: Disclosed is a method of determining focus or dose (f/d) conditions in a lith...