GENEVA, March 2 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/071711) for "SYSTEM AND METHOD FOR SPLIT-IMAGE VARIANCE DECOMPOSITION ANALYSIS" on Jul 28, 2025. With publication no. WO/2026/041357, the details related to the patent application was published on Feb 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WALLOW, Thomas I. (80 W Tasman DriveSan Jose, California 95134)

Abstract: A metrology system includes a radiation source, a lens system, a detector, and a controller. The radiation source generates a beam of radiation. The lens syst...