INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SHUTTER ASSEMBLY FOR A LITHOGRAPHIC APPARATUS"

GENEVA, May 4 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/078385) for "SHUTTER ASSEMBLY FOR A LITHOGRAPHIC APPARATUS" on Oct 02, 2025. With publication no. WO/2026/087195, the details related to the patent application was published on Apr 30, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN DE KERKHOF, Marcus, Adrianus (P.O. Box 3245500 AH Veldhoven)

Abstract: The invention provides a shutter assembly for use in a lithographic apparatus that comprises a shutter and an actuator device for moving the shutter between a closed position and ...