INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, METHOD TO DRIVE A MOVABLE SUPPORT OF A POSITIONING SYSTEM AND METHOD COMPRISING A PATTERNED RADIATION BEAM ONTO A SUBSTRATE"

GENEVA, May 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/076768) for "POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, METHOD TO DRIVE A MOVABLE SUPPORT OF A POSITIONING SYSTEM AND METHOD COMPRISING A PATTERNED RADIATION BEAM ONTO A SUBSTRATE" on Sep 19, 2025. With publication no. WO/2026/092914, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN DRENT, William, Peter (P.O. Box 3245500 AH Veldhoven), KOEVOETS, Adrianus, Hendrik (P.O. Box 3245500 AH Veldhoven)

Abstract: Th...