INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "OPTIMIZING A PATTERNING DEVICE LAYOUT AND A DISCRETIZED PUPIL PROFILE TO CONTROL FACET MIRRORS USED IN A LITHOGRAPHIC PROCESS"

GENEVA, Feb. 2 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/068425) for "OPTIMIZING A PATTERNING DEVICE LAYOUT AND A DISCRETIZED PUPIL PROFILE TO CONTROL FACET MIRRORS USED IN A LITHOGRAPHIC PROCESS" on Jun 27, 2025. With publication no. WO/2026/021792, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PENG, Xingyue (80 W Tasman DriveSan Jose, California 95134), BUONACORSI, Brandon, Roy (80 W Tasman DriveSan Jose, California 95134)

Abstract: A computer-implemented method f...