INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "METHOD AND SYSTEM FOR PERTURBING MASK PATTERN"

GENEVA, June 16 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/082056) for "METHOD AND SYSTEM FOR PERTURBING MASK PATTERN" on Nov 12, 2024. With publication no. WO/2025/119604, the details related to the patent application was published on Jun 12, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KAPLAN, Christopher, James (80 W Tasman DriveSan Jose, California 95134), KABIRI RAHANI, Ehsan (80 W Tasman DriveSan Jose, California 95134)

Abstract: Described herein is a method and system for optimizing a source of a lithographic apparatus using a...