GENEVA, Dec. 22 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/063083) for "METHOD AND DEVICE FOR PRODUCING A PELLICLE FOR A LITHOGRAPHIC APPARATUS" on May 13, 2025. With publication no. WO/2025/256844, the details related to the patent application was published on Dec 18, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): VAN GESTEL, Dries, Els, Victor (P.O. Box 3245500 AH Veldhoven)
Abstract: The invention provides a method of producing a pellicle for covering a patterning device of a lithographic apparatus, the pellicle comprising a film, the...