INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "FULL PLANE DIFFRACTION BASED DIGITAL HOLOGRAPHY METROLOGY SYSTEM AND METHOD"

GENEVA, Dec. 29 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/064026) for "FULL PLANE DIFFRACTION BASED DIGITAL HOLOGRAPHY METROLOGY SYSTEM AND METHOD" on May 21, 2025. With publication no. WO/2025/261702, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SONDE, Aniruddha Ramakrishna (77 Danbury RoadWilton, Connecticut 06897), MUKHERJEE, Arunabh, Samrat (77 Danbury RoadWilton, Connecticut 06897), SHOME, Krishanu (77 Danbury RoadWilton, Connecticut 06897)

Abstract: A metrolo...