GENEVA, Feb. 8 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/068529) for "EXPOSURE METHOD AND EXPOSURE APPARATUS" on Jun 30, 2025. With publication no. WO/2026/027156, the details related to the patent application was published on Feb 05, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): THEEUWES, Thomas (P.O. Box 3245500 AH Veldhoven), MOS, Everhardus, Cornelis (P.O. Box 3245500 AH Veldhoven)
Abstract: A new exposure method for forming a pattern on a plurality of target regions (e.g. fields) of a substrate (e.g. a wafer) is disclosed. The exp...