INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "EXPOSURE APPARATUS RADIATION PULSE INTENSITY MODULATION"

GENEVA, April 13 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/074338) for "EXPOSURE APPARATUS RADIATION PULSE INTENSITY MODULATION" on Aug 27, 2025. With publication no. WO/2026/073634, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BLOK, Sander (P.O. Box 3245500 AH Veldhoven), SAMBRICIO, Jose, Luis (P.O. Box 3245500 AH Veldhoven), MARIN FERNANDEZ, Enrique (P.O. Box 3245500 AH Veldhoven)

Abstract: A method of improving contrast in an exposure apparatus is disclosed. The...