INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "EXPOSURE APPARATUS AND ASSOCIATED METHOD OF DETERMINING A CORRECTION FOR AN EXPOSURE PROCESS"

GENEVA, Feb. 8 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/069036) for "EXPOSURE APPARATUS AND ASSOCIATED METHOD OF DETERMINING A CORRECTION FOR AN EXPOSURE PROCESS" on Jul 03, 2025. With publication no. WO/2026/027172, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): IMPONENTE, Giovanni (P.O. Box 3245500 AH Veldhoven), VAN DE KERKHOF, Marcus, Adrianus (P.O. Box 3245500 AH Veldhoven)

Abstract: There is provided a method of correcting an exposure process for exposing a pa...