INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "DIFFUSION MODEL IN SCANNING CHARGED-PARTICLE MICROSCOPE IMAGE QUALITY ENHANCEMENT"

GENEVA, April 13 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/075474) for "DIFFUSION MODEL IN SCANNING CHARGED-PARTICLE MICROSCOPE IMAGE QUALITY ENHANCEMENT" on Sep 08, 2025. With publication no. WO/2026/073665, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TAO, Jun (80 W Tasman DriveSan Jose, California 95134), CAO, Yu (80 W Tasman DriveSan Jose, California 95134), KANG, Daekwon (80 W Tasman DriveSan Jose, California 95134)

Abstract: An apparatus for determining measu...