INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "CATALYTIC ARRANGEMENT FOR A LASER SYSTEM, IN PARTICULAR CONFIGURED TO PROVIDE A DRIVE LASER IN AN EUV LITHOGRAPHIC SYSTEM"

GENEVA, March 9 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/071882) for "CATALYTIC ARRANGEMENT FOR A LASER SYSTEM, IN PARTICULAR CONFIGURED TO PROVIDE A DRIVE LASER IN AN EUV LITHOGRAPHIC SYSTEM" on Jul 30, 2025. With publication no. WO/2026/046628, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN DRENT, William, Peter (P.O. Box 3245500 AH Veldhoven), MITRAKA, Evangelia (P.O. Box 3245500 AH Veldhoven)

Abstract: The present invention provides a catalytic arrangement f...