INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "BEAM SPLITTING SYSTEMS AND METHODS FOR SEMICONDUCTOR METROLOGY"

GENEVA, Feb. 23 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/070761) for "BEAM SPLITTING SYSTEMS AND METHODS FOR SEMICONDUCTOR METROLOGY" on Jul 18, 2025. With publication no. WO/2026/037592, the details related to the patent application was published on Feb 19, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LE, Martin (77 Danbury RoadWilton, Connecticut 06897), CHEN, Tao (77 Danbury RoadWilton, Connecticut 06897)

Abstract: Achromatic polarization insensitive beam splitting systems and methods for semiconductor metrology are described. One...