INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "ALIGNMENT SYSTEM AND LITHOGRAPHIC APPARATUS"

GENEVA, Feb. 23 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/070760) for "ALIGNMENT SYSTEM AND LITHOGRAPHIC APPARATUS" on Jul 18, 2025. With publication no. WO/2026/037591, the details related to the patent application was published on Feb 19, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JAHANI, Saman (77 Danbury RoadWilton, Connecticut 06897), REZVANI NARAGHI, Roxana (77 Danbury RoadWilton, Connecticut 06897)

Abstract: Disclosed is a photonic integrated circuit metrology sensor comprising: a first interference device being operable to r...