INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "A METROLOGY AND MODELING SOLUTION FOR SPACER DOUBLE PATTERNING TECHNOLOGY"

GENEVA, Dec. 22 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/063300) for "A METROLOGY AND MODELING SOLUTION FOR SPACER DOUBLE PATTERNING TECHNOLOGY" on May 14, 2025. With publication no. WO/2025/256852, the details related to the patent application was published on Dec 18, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HUANG, Jiao (P.O. Box 3245500 AH Veldhoven), FAN, Yongfa (80 W Tasman Dr.San Jose, California 95134), WANG, Jinze (P.O. Box 3245500 AH Veldhoven), ZHAO, Qian (80 W Tasman Dr.San Jose, California 95134)

Abstract: A method of ...