INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "UNIFORM PIXELATED MICROWAVE PLASMA SOURCE WITH SUBSTRATE ROTATION"

GENEVA, March 18 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, CA 95054) filed a patent application (PCT/US2025/042272) for "UNIFORM PIXELATED MICROWAVE PLASMA SOURCE WITH SUBSTRATE ROTATION" on Aug 15, 2025. With publication no. WO/2026/054961, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AUBUCHON, Joseph (1641 Garvey PlaceSan Jose, CA 95132), GUNG, Tza-Jing (933 Sunbonnet LoopSan Jose, CA 95125)

Abstract: Embodiments described herein relate to an apparatus that includes a dielectric plate, and a plurali...