INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SELECTIVE PROCESS FOR SIMULTANEOUS PFET EPI HARDMASK AND NFET PARTIAL BOTTOM DIELECTRIC ISOLATION LAYER FORMATION"

GENEVA, Jan. 6 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/031223) for "SELECTIVE PROCESS FOR SIMULTANEOUS PFET EPI HARDMASK AND NFET PARTIAL BOTTOM DIELECTRIC ISOLATION LAYER FORMATION" on May 28, 2025. With publication no. WO/2026/005941, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BASKER, Veeraraghavan S. (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), COLOMBEAU, Benjamin (c/o Applied Materials...