INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SELECTIVE DEPOSITION OF HIGH-K DIELECTRIC MATERIAL IN GATE INTERFACE"

GENEVA, Feb. 10 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/035625) for "SELECTIVE DEPOSITION OF HIGH-K DIELECTRIC MATERIAL IN GATE INTERFACE" on Jun 27, 2025. With publication no. WO/2026/029900, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BEH, Daniel Wei Ming (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), DEVEREAUX, Zachary J. (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueS...