GENEVA, March 11 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/040566) for "RETAINING RING FOR CMP" on Aug 04, 2025. With publication no. WO/2026/049946, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LEE, Christopher Heung-Gyun (3050 Bowers AvenueSanta Clara, California 95054), CHEUNG, Ghunbong (3050 Bowers AvenueSanta Clara, California 95054), OH, Jeonghoon (3050 Bowers AvenueSanta Clara, California 95054), TRAN, Huyen (3050 Bowers AvenueSanta Clara,...