INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "RESERVOIR-BASED PRECURSOR DELIVERY FOR STABLE AND RAPID FLOW TRANSITIONS IN A PLASMA-ENHANCED ALD PROCESS"

GENEVA, March 31 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/046063) for "RESERVOIR-BASED PRECURSOR DELIVERY FOR STABLE AND RAPID FLOW TRANSITIONS IN A PLASMA-ENHANCED ALD PROCESS" on Sep 12, 2025. With publication no. WO/2026/064209, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KEDLAYA, Diwakar N. (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), SHARMA, Shashank (c/o Applied Materials India Private L...