INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "REMOTE ICR RADICAL DEPOSITION OF TUNABLE LOW-K DIELECTRIC FILMS"

GENEVA, Jan. 20 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/036400) for "REMOTE ICR RADICAL DEPOSITION OF TUNABLE LOW-K DIELECTRIC FILMS" on Jul 03, 2025. With publication no. WO/2026/015372, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Jialiang (755 E Capitol Ave, Apt. M304Milpitas, California 95035), SHARMA, Kashish (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), MALLICK, Abhijit Basu (c/o Ap...