GENEVA, March 18 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/043078) for "OLED FRONT-PLANE MASK REDUCTION" on Aug 22, 2025. With publication no. WO/2026/054995, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LIN, Yu-Hsin (c/o Applied Materials Taiwan, Ltd.No. 32, R&D Road II, Hsinchu Science ParkHsinchu City, 30076), CHEN, Chung-Chia (c/o Applied Materials Taiwan, Ltd.No. 32, R&D Road II, Hsinchu Science ParkHsinchu City, 30076), CHOUNG, Ji Young (c/...