INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "MAGNETRON SPUTTER CATHODE, METHOD OF OPERATING A MAGNETRON SPUTTER CATHODE, SPUTTER DEPOSITION SOURCE, DEPOSITION APPARATUS AND METHOD OF OPERATING A SPUTTER DEPOSITION SOURCE"

GENEVA, Dec. 2 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/030736) for "MAGNETRON SPUTTER CATHODE, METHOD OF OPERATING A MAGNETRON SPUTTER CATHODE, SPUTTER DEPOSITION SOURCE, DEPOSITION APPARATUS, AND METHOD OF OPERATING A SPUTTER DEPOSITION SOURCE" on May 23, 2024. With publication no. WO/2025/244640, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KURITA, Shinichi (1151 Cordelia AvenueSan Jose, California 95129)

Abstract: A magnetron sputter cathod...