INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "LOADING ETCH EFFECT MITIGATION FOR REACTIVE ION ETCHING"

GENEVA, Feb. 18 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/041500) for "LOADING ETCH EFFECT MITIGATION FOR REACTIVE ION ETCHING" on Aug 08, 2024. With publication no. WO/2026/035271, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHERPA, Sonam Dorje (974 E Arques AvenueApplied Materials Building 81Sunnyvale, California 94085), GARCIA DE GORORDO, Alvaro (10000 Spectrum DriveAustin, Texas 78717), REEFMAN, Guus (974 E Arques Ave.Sunnyvale, California 9...