INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "GAP FILL METHODS IN HIGH ASPECT RATIO FEATURES"

GENEVA, Jan. 13 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/034906) for "GAP FILL METHODS IN HIGH ASPECT RATIO FEATURES" on Jun 24, 2025. With publication no. WO/2026/010760, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YEONG, Sai Hooi (10618 North Blaney AvenueCupertino, California 95014), JI, Xiang (Sunnyvale, California), MCGILL, Lisa (3050 Bowers AvenueSanta Clara, California 95054), JHA, Praket P. (3050 Bowers AvenueSanta Clara, California 950...