INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "DOUBLE-SIDED DEEP-TRENCH-CAPACITORS"

GENEVA, Jan. 20 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/035594) for "DOUBLE-SIDED DEEP-TRENCH-CAPACITORS" on Jun 27, 2025. With publication no. WO/2026/015302, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AYERS, Seann William (3050 Bowers AvenueSanta Clara, California 95054)

Abstract: Exemplary semiconductor structures may include a substrate defining a device layer. The structures may include a first deep-trench-capacitor (DTC) coupled to a f...