INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "DEPOSITION-ETCH SPECIES IADF AND IEDF CONTROL FOR CARBON GAPFILL PROCESSES"

GENEVA, April 8 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/047629) for "DEPOSITION-ETCH SPECIES IADF AND IEDF CONTROL FOR CARBON GAPFILL PROCESSES" on Sep 24, 2025. With publication no. WO/2026/072606, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BHUIYAN, Shariful Islam (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), KHAJA, Abdul Aziz (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers Avenue...