GENEVA, April 20 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, CA 95054) filed a patent application (PCT/US2025/049004) for "BATCH PROCESSING TOOL FOR DRY DEVELOP OF EXTREME ULTRA VIOLET (EUV) RESIST LAYER" on Oct 01, 2025. With publication no. WO/2026/080276, the details related to the patent application was published on Apr 16, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KAZEM, Nasrin (3050 Bowers AvenueSanta Clara, CA 95054), WOJTECKI, Rudy (1140 E. Arques AvenueSunnyvale, CA 94085)
Abstract: Embodiments described herein relate to a method of developing a resist layer on...