INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "ASYMMETRIC DEEP-TRENCH-MIM-CAPACITOR (ADTMC)"

GENEVA, Feb. 4 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/038066) for "ASYMMETRIC DEEP-TRENCH-MIM-CAPACITOR (ADTMC)" on Jul 17, 2025. With publication no. WO/2026/024535, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AYERS, Seann William (3050 Bowers AvenueSanta Clara, California 95054)

Abstract: A semiconductor device may include a substrate may include one or more hexagonal trenches extending into the substrate from a first side of the substrate...