INTERNATIONAL PATENT: APPLIED MATERIALS, INC., NATIONAL UNIVERSITY OF SINGAPORE FILES APPLICATION FOR "MEMRISTIVE COMPUTING SCHEMES IN THE BACK-END-OF-THE-LINE"

GENEVA, March 11 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054), NATIONAL UNIVERSITY OF SINGAPORE (21 Lower Kent Ridge RoadSingapore 119077) filed a patent application (PCT/US2025/043121) for "MEMRISTIVE COMPUTING SCHEMES IN THE BACK-END-OF-THE-LINE" on Aug 22, 2025. With publication no. WO/2026/050108, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ASTIER, Hippolyte P.A.G. (21 Lower Kent Ridge RoadSingapore 119077), MANGATTUCHALI, Muhammed Juvaid (21 Lower Kent Ridge RoadSingapore 119077), ...