GENEVA, March 31 -- APPLIED ANGSTROM TECHNOLOGY PTE LTD (Block 81Ajer Rajah Crescent#03-41Singapore 139967) filed a patent application (PCT/SG2024/050610) for "UNIVERSAL ATOMIC LAYER ETCHING DEVICE AND METHOD" on Sep 23, 2024. With publication no. WO/2026/063862, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YANG, Dengliang (Block 81Ajer Rajah Crescent#03-41Singapore 139967)

Abstract: A universal atomic layer etching (ALE) device for both isotropic and anisotropic etching is disclosed The universal ALE device includes ...