International Patent: APPARATUS AND METHOD FOR PROVIDING A MASS FLOW OF A VAPOUR OF A LIQUID OR SOLID STARTING MATERIAL FOR A CVD REACTOR

GENEVA, Aug. 31 -- AIXTRON SE filed a patent application (EP2026/054373) for “APPARATUS AND METHOD FOR PROVIDING A MASS FLOW OF A VAPOUR OF A LIQUID OR SOLID STARTING MATERIAL FOR A CVD REACTOR”. With publication no. WO/2026/175889, here are the other details related to the patent application:

Kind: Initial Publication without ISR [A2]

IPC: C23C 16/455

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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