INTERNATIONAL PATENT: AIXTRON SE FILES APPLICATION FOR "METHOD FOR OPTIMISING A CVD REACTOR AND FOR DEPOSITING LAYERS IN A CVD REACTOR AND A METHOD OR CVD REACTOR OPTIMISED IN THIS WAY"

GENEVA, March 19 -- AIXTRON SE (Dornkaulstr. 252134 Herzogenrath) filed a patent application (PCT/EP2025/075132) for "METHOD FOR OPTIMISING A CVD REACTOR AND FOR DEPOSITING LAYERS IN A CVD REACTOR, AND A METHOD OR CVD REACTOR OPTIMISED IN THIS WAY" on Sep 04, 2025. With publication no. WO/2026/052698, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HAHN, Utz Herwig (Schonsweg 994730 Raeren), KOLLBERG, Marcel (Willibrordstr. 1852146 Wurselen), DAUELSBERG, Martin (Kandelfeldstr. 852074 Aachen), BEE, Levin David Richard Joha...