GENEVA, March 17 -- AIXTRON SE (Dornkaulstr. 252134 Herzogenrath) filed a patent application (PCT/EP2025/074851) for "METHOD AND CVD REACTOR FOR CLEANING PROCESS GASES" on Sep 02, 2025. With publication no. WO/2026/052583, the details related to the patent application was published on Mar 12, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HEUKEN, Michael (Im Erb 1252078 Aachen)
Abstract: The invention relates to a method for processing a used gas produced during the operation of a CVD reactor (4), including all auxiliary gas flows, which used gas is first cleaned in a processing device (40...