GENEVA, March 30 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2025/031491) for "FILM-ATTACHED SUBSTRATE REGENERATION METHOD, METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK" on Sep 05, 2025. With publication no. WO/2026/063242, the details related to the patent application was published on Mar 26, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the Worl...