GENEVA, Oct. 15 -- SHENZHEN MERIT TECHNOLOGY CO.,LTD filed a patent application (CN2026/087178) for “AEROSOL-GENERATING SUBSTRATE STRIP AND AEROSOL-GENERATING SYSTEM”. With publication no. WO/2026/214455, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: A24F 40/57
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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