GENEVA, July 6 -- HITACHI, LTD. filed a patent application (JP2025/041805) for “ABNORMALITY MONITORING SYSTEM AND ABNORMALITY MONITORING METHOD”. With publication no. WO/2026/140697, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01R 19/12
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....