GENEVA, Aug. 31 -- ESSILOR INTERNATIONAL filed a patent application (EP2026/054579) for “A METHOD FOR MEASURING AT LEAST ONE GEOMETRICO-MORPHOLOGICAL PARAMETER OF A SUBJECT WEARING AN EYEWEAR AND AN ASSOCIATED SYSTEM”. With publication no. WO/2026/175995, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G02C 13/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....