Hyderabad, June 30 -- In a major advancement in nanotechnology and advanced materials research, a collaborative team of scientists from the University of Hyderabad (UoH) and the Indian Institute of Technology Hyderabad (IITH) has been granted an Indian patent for a novel technique to fabricate atomically thin transition metal dichalcogenide (TMDC) nanosheets using Bessel beam femtosecond laser ablation.
The patented invention, titled "Method for fabricating one or more layered TMDC material using Bessel beam femtosecond laser ablation" (Application No. 202541061247; Grant No. 593108), offers a highly efficient, rapid and cost-effective alternative to conventional methods of producing TMDC nanosheets, which are widely used in next-generatio...