Japan Intellectual Property Rights: SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Japan, Jan. 27 -- KIOXIA CORP has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE.' Other related details are as follows:

Application Number: JP,2022-145084

Category (FI): H10P50/68@B,H01L21/306@E,H10P50/60@J,H01L21/306@J

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 13, 2022

Publication Date: March 26, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....