Japan, Jan. 28 -- LAM RESEARCH CORPORATION has got intellectual property rights for 'RF PULSE WITHIN PULSE FOR SEMICONDUCTOR RF PLASMA PROCESSING.' Other related details are as follows:

Application Number: JP,2024-106537

Category (FI): H05H1/46@R,H01L21/302,101@C,H10P50/20,101@C,H10P50/24

Stage: Grant (IP right document published.)

Filing Date: July 2, 2024

Publication Date: Oct. 8, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....