Japan, Jan. 28 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST UNDERLAYER FILM FORMING COMPOSITION, PATTERN FORMING METHOD, AND RESIST UNDERLAYER FILM FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-001687

Category (FI): H01L21/30,573,C08K5/06,C08K5/053,C08L65/00,G03F7/039,601,G03F7/11,503,G03F7/11,502,H10P76/00,573

Stage: Grant (IP right document published.)

Filing Date: Jan. 10, 2023

Publication Date: July 23, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....