Japan, Sept. 9 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST MATERIAL AND PATTERNING METHOD.' Other related details are as follows:

Application Number: JP,2023-120592

Category (FI): G03F7/038,601,G03F7/039,601,G03F7/20,501,G03F7/20,521,G03F7/004,503@A

Stage: Grant (IP right granted following substantive examination.)

Filing Date: July 25, 2023

Publication Date: March 7, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....