Japan, Jan. 20 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST MATERIAL AND PATTERN FORMING PROCESS.' Other related details are as follows:

Application Number: JP,2023-007358

Category (FI): G03F7/004,501,G03F7/004,503@A,G03F7/20,521,C08F220/10,C08F212/04,G03F7/004,504,G03F7/039,601

Stage: Grant (IP right document published.)

Filing Date: Jan. 20, 2023

Publication Date: Aug. 17, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....